Cover of Nabil Shovon Ashraf, Shawon Alam, Mohaiminul Alam: New Prospects of Integrating Low Substrate Temperatures with Scaling-Sustained Device Architectural Innovation

Nabil Shovon Ashraf, Shawon Alam, Mohaiminul Alam New Prospects of Integrating Low Substrate Temperatures with Scaling-Sustained Device Architectural Innovation

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Springer International Publishing

2022

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978-3-031-02027-8

3-031-02027-8

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In order to sustain Moore's Law-based device scaling, principal attention has focused on toward device architectural innovations for improved device performance as per ITRS projections for technology nodes up to 10 nm. Efficient integration of lower substrate temperatures (

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