Cover of Cheol Seong Hwang (EDT): Atomic Layer Deposition for Semiconductors

Cheol Seong Hwang (EDT) Atomic Layer Deposition for Semiconductors

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Springer US

2013

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978-1-4614-8054-9

1-4614-8054-X

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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

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