Cover of S. Coffa (EDT), G. Ferla (EDT), E. Rimini (EDT), F. Priolo (EDT): Ion Implantation Technology - 94

S. Coffa (EDT), G. Ferla (EDT), E. Rimini (EDT), F. Priolo (EDT) Ion Implantation Technology - 94

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Elsevier Science

1995

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978-0-444-59972-8

0-444-59972-X

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The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

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